About the Division

The SuMMIT Software Division of EUV Technology develops and markets SEM analysis software for the lithography community. Despite the company name, this software is intended for use in all areas of lithography and mask making, not simply the EUV regime.

SuMMIT Litho Image Analysis Software

SuMMIT is an interactive off-line analysis package for critical dimension (CD) and line-edge/width roughness (LER/LWR) processing of SEM images. This feature-rich analysis program integrates a variety of visualization tools and numerous built-in processing algorithms into a user-friendly GUI. SuMMIT has been in use at several major organizations for the past five years and has been referenced in several scientific papers. A comprehensive description of SuMMIT capabilities can be found at the SuMMIT online documentation section on our support page. For more information on SuMMIT and the available toolboxes, please refer to our product page. To see what's new and upgrade your current version to the latest release please visit our support page.

Purchasing SuMMIT: SuMMIT can be downloaded using the link on our support page, however, in order to install and run the program, license data is required. Please contact our sales department for a quote and delivery of a license file. Volume and student pricing available. Time-limited trial licenses are also available upon request.

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