| About The Division |
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| SuMMIT Litho Image Analysis Software |
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SuMMIT is an interactive off-line analysis package for critical dimension (CD), line-edge/width roughness (LER/LWR), process window, contact hole, and corner rounding processing of image data. SuMMIT works with a wide variety of image data including, SEM, aerial-image microscope, AFM, modeling ... This feature-rich analysis program integrates a variety of visualization tools and numerous built-in processing algorithms into a user-friendly, yet powerful, GUI with automation capabilities. Introduced in 2004, SuMMIT is in use througout the lithography industry and has been referenced in numerous scientific papers. For more information on SuMMIT and the available toolboxes, please refer to our product page. To see what's new and upgrade your current version to the latest release please visit our support page.
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| Purchasing SuMMIT |
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SuMMIT can be downloaded through our support page, however, in order to install and run the program, a license key is required. Please contact our sales department for a quote and delivery of a license file. Volume and student pricing available. Time-limited trial licenses are also available upon request.
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| Application Notes |
| #1 - SuMMIT is not just for SEMs anymore #2 - Dealing with large datasets #3 - Measuring Corners |
| Scientific references |
| Publication list |
The SuMMIT Software Division of EUV Technology
Corporation develops and markets Litho analysis and modeling software.
Despite the company name, our software is intended for use in
all areas of lithography and mask making, not simply the EUV regime.
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