Specifications of the EUV Technology Stand-alone Hydrogen Radical cleaning unit Model No. HC12.1

  • Filament temperature:1850 to 2000 C
  • H2 flow: 50 SCCM (max)
  • H2 pressure: 20 mbar (max)
  • Sample temperature: 60 C (max) – Water cooled
  • Cleaning rate ~ 3 nm/hour
  • MFC to control the H2 flow
  • Another MFC to control the N2 flow.
  • Diluted to 1% by volume before exhausting
  • Interlocked so that H2 will not flow if there is not sufficient N2 flow to dilute the H2
  • Fully automated user friendly operation – Except loading and unloading WS