Since 1997 EUV Technology has manufactured R&D tools for EUV Lithography. We have provided many of the principal players in the semiconductor industry with EUV calibration tools. Our customers include Lawrence Livermore Laboratory, International SEMATECH, the IMEC organization in Leuven, Belgium, and major semiconductor manufacturers in the USA and Asia.
In 2005, EUV Technology's LPR1016 Reflectometer was awarded Rsearch and Development Magazine's "R&D 100 Award" and was thus heralded by the magazine's editors as "one of the 100 most technologically significant products introduced into the marketplace over the past year."
EUV Technology's two principal products are:
LPR1016 Reflectometer, (U.S. patent 6,738,135 B1).
RET 125-75 Resist Exposure tool. (U.S. Patent applied for).
Our research group can also provide custom solutions to problems related to EUV sources and optics, EUV Lithography, and in-vacuum processing of semiconductors.
